Permanent contamination enters the cleaning and rinsing bath through the cleaning of electronic assemblies. In addition to the contamination, there are also process-dependent influences, such as extraction, evaporation or the spread of cleaner into the rinsing water which can adversely affect the end result.
Regular wash tank monitoring is necessary to ensure consistent results in cleaning processes of electronic assemblies or power electronics. There are manual and automatic methods available.
Three important process parameters can provide information about the quality of the cleaning or rinsing bath:
The concentration is important. To achieve the optimum performance of aqueous cleaners, the recommended application concentration must be kept constant within a defined range.
For this purpose, two different kinds of measurement methods are available: