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Zestron

Water-free Cleaning

It is typical for water-free cleaning that solvent-based cleaning step is carried out first. Subsequently rinsing takes place using the same or another solvent in one or several rinsing steps.
Traditional ultrasonic as well as spray-under-immersion equipment and the one-chamber solvent processes are mostly commonly used. For equipment with multiple chambers, ZESTRON recommends the use of Co-Solvent in combination with HFE based materials.

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