[Manassas, VA – October 12, 2016] - ZESTRON, the global leading provider of high precision cleaning products, services and training solutions in the electronics manufacturing and semiconductor industries, is pleased to announce that Naveen Ravindran, M.S.Ch.E., Application Engineer, ZESTRON Americas, will present “Concentration Monitoring & Process Control – Case Studies” at the IPC SMTA High-Reliability Cleaning and Conformal Coating Conference in Rosemont, IL.
With any cleaning system, wash bath contamination accumulates over time, principally in the form of flux residues. The ability to determine accurate wash bath concentration in the presence of contamination is critical to all monitoring and control systems. This presentation reviews comparative test and customer field data with recommendations for best practices with regard to cleaning system process control.
Mr. Ravindran’s presentation will be on Wednesday, October 26th, during the Cleaning Materials, Machines, Rinsing and Process Control session. For more information or to register for this event, please visit ipc.org.