Can one Effectively Clean Under Low Stand Off Components?
ZESTRON AMERICA'S WHITEPAPER-COLLECTION
Whitepaper-collection Can one Effectively Clean Under Low Stand Off Components?
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[ZESTRON Americas - Dr. Andreas Muehlbauer, Dr. Helmut Schweigart and Mr. Stefan Strixner]
ABSTRACT:
With the ban of CFC’s, various cleaning processes have emerged and have been established as viable alternatives1,2,3. Several cleaning processes such as ultrasonic and spray in air batch and in-line have become firmly established. Each equipment type typically has its advantages and disadvantages, which will obviously be of different significance to the end-user.
This in-depth study sets out to determine which mechanical agitation cleaning system might demonstrate the best cleaning results with regard to cleaning performance. To address the most currently available technologies, ultrasonic, pressurized spray-inair, spray-under-immersion, and centrifugal cleaning systems were taken as a
representative basis.
To guarantee meaningful results, the most demanding application was chosen: the cleaning under large surface components. A significant conclusion of the study is that the cleaning chemistry is significantly more important than the equipment technology used.
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