Advanced and Gentle Ultrasonic Cleaning


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[Christoph Karl; Kristyna Zakova]

Despite myths about ultrasonic damage to circuit boards, innovations by machine suppliers and the IPC ensure safe cleaning. This Whitepaper explains how modern ultrasonic cleaning works, highlighting the importance of correct frequency, setup, and standardized testing for gentle, effective cleaning.

Delivery form: PDF



Article number: EN-2406-05


A persistent myth or presumption exists in the electronic market regarding ultrasonics generally damaging components on circuit boards. Machine suppliers and standardization organizations such as the IPC however implemented innovations and improvements to prevent damage caused by ultrasonics. 

The present Whitepaper will show how modern ultrasonic cleaning works and how methods to prevent harm are used effectively. Correct choice of frequency, setup of parameters and relative movement of goods to clean are essential for gentle cleaning. Standardized testing methods carried out prior to establishment of a cleaning process can ensure gentle cleaning. 

Christoph Karl

Project Engineer Applied Research, ZESTRON Europe

Christoph Karl studied Mechanical Engineering with a specialization in Materials Engineering, earning a Dipl.Ing. degree. He then worked at the University of Birmingham and in the automotive supply industry.

At Zestron, he is active in the Applied Research Group, where he oversees topics and research projects related to metrology, analytics, plant engineering, and Design of Experiment (DoE).

In the Applied Research Group, he collaborates with R&D and application technology to develop new methods for analyzing cleaning under components and presents results in a highly targeted manner.

Kristyna Zakova

Project Engineer Applied Research,

Kristyna Zakova studied Mechanical Engineering with a focus on Manufacturing Technology and Quality Management at the University of West Bohemia in Pilsen and worked during her studies in the Material Innovation Lab at an LED manufacturer. Afterward, she was employed in Quality Management at a manufacturer of industrial cleaning systems, where she was also responsible for system tests and FACs.

At Zestron, she works in the Applied Research department, engaging in research projects both internally and in cooperation with external partners. Her focus is on analytics, particularly ion chromatography and technical cleanliness, as well as the exploration of new analytical methods and the requirements for cleaning challenging surfaces. Thanks to her practical experience in the lab and plant engineering, she places great emphasis on the feasibility and real-world applicability of research results.